White Paper

Extending Design Technology Co-Optimization from Technology Launch to Hvm with Calibre Fab Solutions

Extending Design Technology Co-Optimization from Technology Launch to Hvm with Calibre Fab Solutions

In the ever-evolving landscape of semiconductor design, staying ahead of systematic defects requires a proactive approach. Traditionally, validation mechanisms such as DRC sign-off, OPC verification, and physical failure analysis have played crucial roles in preventing systematic defects. However, with the increasing complexity of design processes, traditional approaches like DFM and LFD are no longer sufficient.

Enter the era of systematic information exchange and analytics. Download the white paper and how to extend design-technology co-optimization (DTCO) with Calibre Fab Solutions, a systematic information exchange and analytics platform that improves the efficiency of the design-to-manufacturing flow.

Ready to revolutionize your approach to semiconductor design? Download the white paper today and unlock the potential of intramodule validation mechanisms.

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